Development of new nanofabrication methods is always a significant issue of concern. Recently, the friction-induced nanofabrication was proposed to produce

protrusive nanostructures on Si(100) surface by scanning a diamond tip on a target sample without any post-etching [7]. Besides silicon, this method can also enable the fabrication on electrical insulators, such as quartz and glass. As a straightforward and maskless method, the friction-induced nanofabrication points out a new route in fabricating nanostructures on demand. It is well known that monocrystalline silicon has three typical crystal planes, i.e., (100), (110), and (111). As a typically anisotropic material, monocrystalline silicon presents different elastic modulus on various crystal planes, namely 130 GPa on Si(100), 169 GPa on Si(110), and 188 GPa on Si(111), eFT508 datasheet respectively [8]. Experimental results showed that the cutting process GS-1101 mw and friction behavior of silicon were influenced by the crystal anisotropy [9, 10]. Based on pin-on-disk tests, the average friction coefficient measured on Si(100) wafer was about 80% higher than that on Si(110) and Si(111) wafers [10].

Moreover, because of the difference in the density of dangling bonds and PKC inhibitor structure of back bonds, the etching rate of Si(100) or Si(110) was two orders of magnitude faster than that of Si(111) in alkaline solution [11, 12]. These anisotropic properties of monocrystalline silicon may induce the different nanofabrication behavior on silicon surfaces with various crystal planes. Therefore, even though the friction-induced nanofabrication enables producing protrusive nanostructures on Si(100) surface, it remains unknown whether the same nanofabrication method can be realized on other silicon crystal planes. In the present study, the effect of crystal plane orientation on the friction-induced Sodium butyrate nanofabrication on monocrystalline silicon was investigated. To verify whether the friction-induced fabrication can be realized on various silicon crystal planes, scratch tests at a linearly increasing load were performed on Si(100), Si(110), and Si(111)

surfaces, respectively. The effect of crystal plane orientation on the formation of friction-induced hillocks was further detected by scanning three silicon crystal planes under a constant normal load. Finally, the formation mechanism of the hillock on various silicon crystal planes was discussed based on their mechanical performance and bond structure. Methods Materials Si(100), Si(110), and Si(111) wafers were purchased from MCL Electronic Materials Ltd., Luoyang, China. The surface root-mean-square roughness of the wafers was measured as less than 0.2 nm over a square of 2 × 2 μm2 by an atomic force microscope (AFM; SPI3800N, Seiko Instruments Inc., Tokyo, Japan). The mechanical properties of the wafers were detected by a triboindenter (TI750, Hysitron Inc.